COMPOSITION FOR FORMING ANTIREFLECTION COATING

Details for Australian Patent Application No. 2003302526 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors HIRAYAMA, Taku; YAMADA, Tomotaka; KAWANA, Daisuke; TAMURA, Kouki; SATO, Kazufumi

Pub. Number AU-A-2003302526

PCT Number PCT/JP2003/0153

PCT Pub. Number WO2004/051376

Priority 2002-382898 02.12.02 JP; 2003-116164 21.04.03 JP

Filing date 1 December 2003

Wipo publication date 23 June 2004

International Classifications

G03F 007/11 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - having cover layers or intermediate layers, e.g. subbing layers

C08G 077/14 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 July 2004 Complete Application Filed

  Priority application(s): 2002-382898 02.12.02 JP; 2003-116164 21.04.03 JP

29 July 2004 Application Open to Public Inspection

  Published as AU-A-2003302526

22 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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