PROCESS FOR PRODUCING PHOTORESIST COMPOSITION, FILTER, COATER AND PHOTORESIST COMPOSITION

Details for Australian Patent Application No. 2003289431 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors SHIMAZAKI, Masaaki; MUROI, Masaaki; ATSUCHI, Kota; TOMIDA, Hiroaki; OZAKI, Hirokazu; HADA, Hideo; IWAI, Takeshi

Pub. Number AU-A-2003289431

PCT Number PCT/JP2003/0162

PCT Pub. Number WO2004/057422

Priority 2002-368931 19.12.02 JP; 2003-416583 15.12.03 JP

Filing date 18 December 2003

Wipo publication date 14 July 2004

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

B01D 061/14 Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration - Ultrafiltration

B01D 071/56 Semi-permeable membranes for separation processes or apparatus characterised by the material

B01D 071/26 Semi-permeable membranes for separation processes or apparatus characterised by the material

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 2002-368931 19.12.02 JP; 2003-416583 15.12.03 JP

19 August 2004 Application Open to Public Inspection

  Published as AU-A-2003289431

8 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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