POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Details for Australian Patent Application No. 2003289430 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors SATO, Kazufumi; HAGIHARA, Mitsuo; KAWANA, Daisuke

Pub. Number AU-A-2003289430

PCT Number PCT/JP2003/0162

PCT Pub. Number WO2004/059392

Priority 2002-376294 26.12.02 JP

Filing date 18 December 2003

Wipo publication date 22 July 2004

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 2002-376294 26.12.02 JP

26 August 2004 Application Open to Public Inspection

  Published as AU-A-2003289430

15 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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