METHOD FOR FORMING RESIST PATTERN AND RESIST PATTERN

Details for Australian Patent Application No. 2003289125 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors ISHIKAWA, Kiyoshi; SATO, Mitsuru; MATSUMIYA, Tasuku; FUJII, Kazuhiro; SATO, Kenichi; KUBOTA, Naotaka

Pub. Number AU-A-2003289125

PCT Number PCT/JP2003/0154

PCT Pub. Number WO2004/051380

Priority 2002-350465 02.12.02 JP; 2003-151574 28.05.03 JP

Filing date 2 December 2003

Wipo publication date 23 June 2004

International Classifications

G03F 007/40 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment after imagewise removal, e.g. baking

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 2002-350465 02.12.02 JP; 2003-151574 28.05.03 JP

29 July 2004 Application Open to Public Inspection

  Published as AU-A-2003289125

18 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

1 September 2005 Corrigenda

  Applications OPI - Name Index Under the name TOKYO OHKA KOGYO CO., LTD., Application No. 2003289125, under INID (71) correct the name to read HITACHI SCIENCE SYSTEMS, LTD.; HITACHI HIGH-TECHNOLOGIES CORPORATION; TOKYO OHKA KOGYO CO., LTD.

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