COMPOSITION FOR ANTIREFLECTION FILM FORMATION

Details for Australian Patent Application No. 2003281013 (hide)

Owner NISSAN CHEMICAL INDUSTRIES, LTD.

Inventors KISHIOKA, Takahiro; ARASE, Shinya; MIZUSAWA, Ken-ichi; NAKAYAMA, Keisuke

Pub. Number AU-A-2003281013

PCT Number PCT/JP2003/0088

PCT Pub. Number WO2004/008253

Priority 2002-208045 17.07.02 JP; 2002-302535 17.10.02 JP

Filing date 11 July 2003

Wipo publication date 2 February 2004

International Classifications

G03F 007/11 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - having cover layers or intermediate layers, e.g. subbing layers

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 March 2004 Complete Application Filed

  Priority application(s): 2002-208045 17.07.02 JP; 2002-302535 17.10.02 JP

18 March 2004 Application Open to Public Inspection

  Published as AU-A-2003281013

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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