193NM RESIST

Details for Australian Patent Application No. 2003273924 (hide)

Owner INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventors VARANASI, Pushkara, Rao; NISHIMURA, Yukio; KOBAYASHI, Eiichi; KHOJASTEH, Mahmoud, M.; CHEN, Kuang-Jung

Pub. Number AU-A-2003273924

PCT Number PCT/EP03/10688

PCT Pub. Number WO2004/029719

Priority 10/261,249 30.09.02 US

Filing date 28 August 2003

Wipo publication date 19 April 2004

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

12 February 2004 Complete Application Filed

  Priority application(s): 10/261,249 30.09.02 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003273924

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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