METHOD OF PHOTO-THERMAL INDUCED DIFFUSION AND APPARATUS WITH ELECTRICALLY CONDUCTIVE TRACE

Details for Australian Patent Application No. 2003272412 (hide)

Owner INTEL CORPORATION

Inventors BRIST, Gary; LONG, Gary; SATO, Daryl

Pub. Number AU-A-2003272412

PCT Number PCT/US03/28926

PCT Pub. Number WO2004/026524

Priority 10/252,304 23.09.02 US

Filing date 12 September 2003

Wipo publication date 8 April 2004

International Classifications

B23K 026/34 Working by laser beam, e.g. welding, cutting, boring

H01L 023/498 Details of semiconductor or other solid state devices

H01L 021/24 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 008/78 Solid state diffusion into metallic material surfaces

C25D 005/02 Electroplating characterised by the process - Electroplating of selected surface areas

H01R 013/03 Details of coupling devices of the kinds covered by groups or - characterised by the material, e.g. plating or coating materials

B23K 026/00 Working by laser beam, e.g. welding, cutting, boring

H05K 003/02 Apparatus or processes for manufacturing printed circuits - in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding

H05K 003/10 Apparatus or processes for manufacturing printed circuits - in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern

Event Publications

22 January 2004 Complete Application Filed

  Priority application(s): 10/252,304 23.09.02 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003272412

7 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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