CLEANING METHOD FOR SUBSTRATE-PROCESSING DEVICE AND THE DEVICE

Details for Australian Patent Application No. 2003257621 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors OSHIMA, Yasuhiro; KANNAN, Hiroshi

Pub. Number AU-A-2003257621

PCT Number PCT/JP03/10507

PCT Pub. Number WO2004/020693

Priority 2002/252269 30.08.02 JP

Filing date 20 August 2003

Wipo publication date 19 March 2004

International Classifications

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

6 November 2003 Complete Application Filed

  Priority application(s): 2002/252269 30.08.02 JP

6 May 2004 Application Open to Public Inspection

  Published as AU-A-2003257621

19 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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