MASK BLANK MANUFACTURING METHOD, TRANSFER MASK MANUFACTURING METHOD, SPUTTERING TARGET FOR MANUFACTURING MASK BLANK

Details for Australian Patent Application No. 2003257547 (hide)

Owner HOYA CORPORATION

Inventors MITSUI, Masaru

Pub. Number AU-A-2003257547

PCT Number PCT/JP03/10438

PCT Pub. Number WO2004/017140

Priority 2002-238564 19.08.02 JP

Filing date 19 August 2003

Wipo publication date 3 March 2004

International Classifications

G03F 001/08 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having inorganic imaging layers, e.g. chrome masks

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

6 November 2003 Complete Application Filed

  Priority application(s): 2002-238564 19.08.02 JP

22 April 2004 Application Open to Public Inspection

  Published as AU-A-2003257547

19 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2003257548-INSPECTION CONDITION DATA MANAGEMENT METHOD, SYSTEM, PROGRAM, AND INSPECTION DEVICE

2003257546-NOVEL COMPOSITION CONTAINING ACYL GROUP