METHOD OF FORMING INSULATION FILM ON SEMICONDUCTOR SUBSTRATE

Details for Australian Patent Application No. 2003255034 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors HONGOH, Toshiaki

Pub. Number AU-A-2003255034

PCT Number PCT/JP03/10357

PCT Pub. Number WO2004/017396

Priority 2002-236343 14.08.02 JP

Filing date 14 August 2003

Wipo publication date 3 March 2004

International Classifications

H01L 021/316 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 029/786 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

Event Publications

30 October 2003 Complete Application Filed

  Priority application(s): 2002-236343 14.08.02 JP

22 April 2004 Application Open to Public Inspection

  Published as AU-A-2003255034

5 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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