ETCHING METHOD AND PLASMA ETCHING DEVICE

Details for Australian Patent Application No. 2002367178 (hide)

Owner TOKYO ELECTRON LIMITED KABUSHIKI KAISHA TOSHIBA

Inventors MATSUMOTO, Takanori; YAMAMOTO, Kenji; HIGUCHI, Fumihiko; HORIGUCHI, Katsumi; SHIMONISHI, Satoshi

Pub. Number AU-A-2002367178

PCT Number PCT/JP02/13479

PCT Pub. Number WO2003/056617

Priority 2001-397899 27.12.01 JP

Filing date 25 December 2002

Wipo publication date 15 July 2003

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002367178

4 September 2003 Complete Application Filed

  Priority application(s): 2001-397899 27.12.01 JP

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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