METHOD AND APPARATUS FOR NITRIDE SPACER ETCH PROCESS IMPLEMENTING IN SITU INTERFEROMETRY ENDPOINT DETECTION AND NON-INTERFEROMETRY ENDPOINT MONITORING

Details for Australian Patent Application No. 2002353877 (hide)

Owner LAM RESEARCH CORPORATION

Inventors CHOU, Wen-Ben; CHENG, Shih-Yuan; TU, Wayne

Pub. Number AU-A-2002353877

PCT Number PCT/US02/34140

PCT Pub. Number WO2003/038889

Priority 09/998,858 31.10.01 US

Filing date 23 October 2002

Wipo publication date 12 May 2003

International Classifications

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 09/998,858 31.10.01 US

10 July 2003 Application Open to Public Inspection

  Published as AU-A-2002353877

15 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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