METHOD OF FORMING LAYERS OF OXIDE OF DIFFERENT THICKNESSES ON A SURFACE OF A SUBSTRATE

Details for Australian Patent Application No. 2002351408 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors WIECZOREK, Karsten; GRAETSCH, Falk; KRUEGEL, Stephan

Pub. Number AU-A-2002351408

PCT Number PCT/US02/40807

PCT Pub. Number WO2003/073491

Priority 102 07 122.5 20.02.02 DE; 10/208,308 30.07.02 US

Filing date 20 December 2002

Wipo publication date 9 September 2003

International Classifications

H01L 021/311 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/8238 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/8234 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/314 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/318 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 102 07 122.5 20.02.02 DE; 10/208,308 30.07.02 US

16 October 2003 Application Open to Public Inspection

  Published as AU-A-2002351408

4 November 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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