METHOD FOR FORMING AN IMPROVED METAL SILICIDE CONTACT TO A SILICON-CONTAINING CONDUCTIVE REGION

Details for Australian Patent Application No. 2002351407 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors WIECZOREK, Karsten; KAHLERT, Volker; HORSTMANN, Manfred

Pub. Number AU-A-2002351407

PCT Number PCT/US02/40806

PCT Pub. Number WO2003/083936

Priority 10/282,665 29.10.02 US; 102 14 065.0 28.03.02 DE

Filing date 20 December 2002

Wipo publication date 13 October 2003

International Classifications

H01L 021/768 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 10/282,665 29.10.02 US; 102 14 065.0 28.03.02 DE

20 November 2003 Application Open to Public Inspection

  Published as AU-A-2002351407

16 December 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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