METHOD AND APPARATUS FOR PRODUCING UNIFORM ISOTROPIC STRESSES IN A SPUTTERED FILM

Details for Australian Patent Application No. 2002331687 (hide)

Owner NANONEXUS, INC.

Inventors SMITH, Donald, Leonard

Pub. Number AU-A-2002331687

PCT Number PCT/US02/26785

PCT Pub. Number WO2003/018865

Priority 60/314,776 24.08.01 US

Filing date 23 August 2002

Wipo publication date 10 March 2003

International Classifications

C23C 014/35 Coating by vacuum evaporation, by sputtering or by ion implantation - by application of a magnetic field, e.g. magnetron sputtering

C23C 014/34 Coating by vacuum evaporation, by sputtering or by ion implantation - Sputtering

B05D 001/36 Processes for applying liquids or other fluent materials - Successively applying liquids or other fluent materials, e.g. without intermediate treatment

B05C 011/00 Component parts, details or accessories not specifically provided for in groups

B05C 013/00 Means for manipulating or holding work, e.g. for separate articles

Event Publications

6 February 2003 Complete Application Filed

  Priority application(s): 60/314,776 24.08.01 US

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002331687

17 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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