IN-SITU OR EX-SITU PROFILE MONITORING OF PHASE OPENINGS ON ALTERNATING PHASE SHIFTING MASKS BY SCATTEROMETRY

Details for Australian Patent Application No. 2002309546 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors TABERY, Cyrus, E.; PHAN, Khoi, A.; RANGARAJAN, Bharath; SINGH, Bhanwar; SUBRAMANIAN, Ramkumar

Pub. Number AU-A-2002309546

PCT Number PCT/US02/10826

PCT Pub. Number WO2003/026000

Priority 09/955,517 18.09.01 US

Filing date 5 April 2002

Wipo publication date 1 April 2003

International Classifications

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

G01N 021/47 Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light - Scattering, i.e. diffuse reflection

G01B 011/30 Measuring arrangements characterised by the use of optical means - for measuring roughness or irregularity of surfaces

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G03F 001/00 Preparation of originals for the photomechanical production of textured or patterned surfaces

Event Publications

19 December 2002 Complete Application Filed

  Priority application(s): 09/955,517 18.09.01 US

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002309546

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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