POLYCYCLIC FLUORINE-CONTAINING POLYMERS AND PHOTORESISTS FOR MICROLITHOGRAPHY

Details for Australian Patent Application No. 2002306974 (hide)

Owner E. I. DU PONT DE NEMOURS AND COMPANY

Inventors FEIRING, Andrew, E.; SCHADT, Frank, L., III

Pub. Number AU-A-2002306974

PCT Number PCT/US02/09799

PCT Pub. Number WO2002/079287

Priority 60/280,269 30.03.01 US

Filing date 27 March 2002

Wipo publication date 15 October 2002

International Classifications

C08F 232/08 Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

Event Publications

19 December 2002 Complete Application Filed

  Priority application(s): 60/280,269 30.03.01 US

3 April 2003 Application Open to Public Inspection

  Published as AU-A-2002306974

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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