MULTI-LAYERED FILM REFLECTOR MANUFACTURING METHOD

Details for Australian Patent Application No. 2002233736 (hide)

Owner NIKON CORPORATION

Inventors KANDAKA, Noriaki; YAMAMOTO, Masaki

Pub. Number AU-A-2002233736

PCT Pub. Number WO2002/084671

Priority 2001-113195 11.04.01 JP

Filing date 26 February 2002

Wipo publication date 28 October 2002

International Classifications

G21K 001/06 Arrangements for handling radiation or particles, e.g. focusing, moderating

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

17 April 2003 Application Open to Public Inspection

  Published as AU-A-2002233736

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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