MASK, OPTICAL CHARACTERISTIC MEASURING METHOD, EXPOSURE APPARATUS ADJUSTING METHOD AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2002228395 (hide)

Owner NIKON CORPORATION

Inventors TAKEMASA, Kengo

Pub. Number AU-A-2002228395

PCT Pub. Number WO2002/061505

Priority 2001-24742 31.01.01 JP; 2001-26523 02.02.01 JP

Filing date 31 January 2002

Wipo publication date 12 August 2002

International Classifications

G03F 001/08 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having inorganic imaging layers, e.g. chrome masks

G01M 011/02 Testing of optical apparatus - Testing of optical properties

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

20 February 2003 Application Open to Public Inspection

  Published as AU-A-2002228395

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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