Method for texturing silicon wafers, treatment liquid therefor, and use

Details for Australian Patent Application No. 2010220289 (hide)

Owner Gebr. Schmid GmbH & Co.

Inventors Maher, Izaaryene

Agent Griffith Hack

Pub. Number AU-A-2010220289

PCT Pub. Number WO2010/100185

Priority 10 2009 012 827.1 03.03.09 DE

Filing date 3 March 2010

Wipo publication date 10 September 2010

International Classifications

H01L 31/0236 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Special surface textures

H01L 31/18 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

Event Publications

22 September 2011 PCT application entered the National Phase

  PCT publication WO2010/100185 Priority application(s): WO2010/100185

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