Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers

Details for Australian Patent Application No. 2010218275 (hide)

Owner Avantor Performance Materials, Inc.

Inventors Westwood, Glenn

Agent Phillips Ormonde Fitzpatrick

Pub. Number AU-A-2010218275

PCT Pub. Number WO2010/099017

Priority 61/232,800 11.08.09 US; 61/155,206 25.02.09 US

Filing date 18 February 2010

Wipo publication date 2 September 2010

International Classifications

C11D 3/00 (2006.01) Other compounding ingredients of detergent compositions covered in group

C11D 7/08 (2006.01) Compositions of detergents based essentially on non-surface-active compounds

C11D 7/10 (2006.01) Compositions of detergents based essentially on non-surface-active compounds

C11D 7/32 (2006.01) Compositions of detergents based essentially on non-surface-active compounds

C11D 7/36 (2006.01) Compositions of detergents based essentially on non-surface-active compounds

C11D 7/50 (2006.01) Compositions of detergents based essentially on non-surface-active compounds - Solvents

C11D 11/00 (2006.01) Special methods for preparing compositions containing mixtures of detergents

G03F 7/42 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Stripping or agents therefor

Event Publications

20 October 2011 PCT application entered the National Phase

  PCT publication WO2010/099017 Priority application(s): WO2010/099017

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