Method for the selective doping of silicon and silicon substrate treated therewith

Details for Australian Patent Application No. 2009237980 (hide)

Owner Gebr. Schmid GmbH & Co.

Inventors Habermann, Dirk

Agent Griffith Hack

Pub. Number AU-A-2009237980

PCT Pub. Number WO2009/127369

Priority 10 2008 019 402.6 14.04.08 DE

Filing date 9 April 2009

Wipo publication date 22 October 2009

International Classifications

H01L 31/0216 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Coatings

H01L 31/0224 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Electrodes

H01L 31/068 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

H01L 21/225 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

9 December 2010 PCT application entered the National Phase

  PCT publication WO2009/127369 Priority application(s): WO2009/127369

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