Highly pure lanthanum, sputtering target comprising highly pure lanthanum, and metal gate film mainly composed of highly pure lanthanum
Details for Australian Patent Application No. 2008344685 (hide)
International Classifications
Event Publications
24 June 2010 PCT application entered the National Phase
PCT publication WO2009/084318 Priority application(s): WO2009/084318
5 August 2010 Amendment Made
The nature of the amendment is as shown in the statement(s) filed 02 Jul 2010
7 October 2010 Alteration of Name
The name of the applicant has been altered to JX Nippon Mining & Metals Corporation 2009
27 September 2012 Application Accepted
Published as AU-B-2008344685
Legal
The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.
Next and Previous Patents/Applications
IP Reporting Samples
Customised IP Reporting
IP Insider for IP Professionals
IP Monitor Professional
- Editable Word format reports
- For IP Professionals
- Multiuser