A method of making a secondary imprint on an imprinted polymer

Details for Australian Patent Application No. 2008269284 (hide)

Owner Agency for Science, Technology and Research

Inventors Low, Hong Yee; Chong, Karen

Agent Spruson & Ferguson

Pub. Number AU-A-2008269284

PCT Pub. Number WO2009/002272

Priority 60/946,443 27.06.07 US

Filing date 23 June 2008

Wipo publication date 31 December 2008

International Classifications

G03F 7/00 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces

B81B 7/00 (2006.01) Micro-structural systems

B82B 3/00 (2006.01) Manufacture or treatment of nano-structures

H01L 21/027 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

28 January 2010 PCT application entered the National Phase

  PCT publication WO2009/002272 Priority application(s): WO2009/002272

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