Method for forming a film on a substrate

Details for Australian Patent Application No. 2008221198 (hide)

Owner Sixtron Advanced Materials, Inc.

Inventors El Khakani, My Ali; Gaumond, Alexandre; Smirani, Riadh; Davies, Michael; Awad, Yousef; Allen, Sebastien

Agent Davies Collison Cave

Pub. Number AU-A-2008221198

PCT Pub. Number WO2008/104059

Priority 60/971,442 11.09.07 US; 60/891,790 27.02.07 US

Filing date 27 February 2008

Wipo publication date 4 September 2008

International Classifications

C23C 16/513 (2006.01) Chemical deposition or plating by decomposition

C23C 16/30 (2006.01) Chemical deposition or plating by decomposition - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

C23C 16/452 (2006.01) Chemical deposition or plating by decomposition

C23C 16/56 (2006.01) Chemical deposition or plating by decomposition - After-treatment

Event Publications

15 October 2009 PCT application entered the National Phase

  PCT publication WO2008/104059 Priority application(s): WO2008/104059

2 December 2010 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(a). A direction to request examination has been given for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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