Vacuum processing method and vacuum processing apparatus

Details for Australian Patent Application No. 2008218436 (hide)

Owner Mitsubishi Heavy Industries, Ltd.

Inventors Nishimiya, Tatsuyuki; Miyahara, Hiroomi

Agent FB Rice

Pub. Number AU-A-2008218436

PCT Pub. Number WO2008/102622

Priority 2007-043270 23.02.07 JP

Filing date 30 January 2008

Wipo publication date 28 August 2008

International Classifications

H01L 21/205 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 31/04 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - adapted as conversion devices

Event Publications

23 April 2009 PCT application entered the National Phase

  PCT publication WO2008/102622 Priority application(s): WO2008/102622

2 July 2009 Amendment Made

  The nature of the amendment is: Amend the invention title to read Vacuum treatment method and vacuum treatment apparatus

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