Method and device for forming vapor deposition film by surface liquid plasma

Details for Australian Patent Application No. 2006234466 (hide)

Owner Toyo Seikan Kaisha, Ltd.

Inventors Yamada, Kouji; Kurashima, Hideo; Inagaki, Hajime; Kunihiro, Ichiro

Agent Phillips Ormonde Fitzpatrick

Pub. Number AU-A-2006234466

PCT Pub. Number WO2006/109754

Priority 2005-121206 19.04.05 JP; 2005-109337 06.04.05 JP

Filing date 3 April 2006

Wipo publication date 19 October 2006

International Classifications

C23C 16/511 (2006.01) Chemical deposition or plating by decomposition

Event Publications

1 November 2007 PCT application entered the National Phase

  PCT publication WO2006/109754 Priority application(s): WO2006/109754

5 November 2009 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(a). A direction to request examination has been given for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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