System and process for high-density,low-energy plasma enhanced vapor phase epitaxy

Details for Australian Patent Application No. 2006224282 (hide)

Owner Sulzer Metco AG

Inventors Von Kaenel, Hans

Agent Wrays

Pub. Number AU-B-2006224282

PCT Pub. Number WO2006/097804

Priority 60/657,208 28.02.05 US

Filing date 28 February 2006

Wipo publication date 21 September 2006

Acceptance publication date 2 February 2012

International Classifications

C23C 14/32 (2006.01) Coating by vacuum evaporation, by sputtering or by ion implantation - by explosion

C30B 23/08 (2006.01) Single-crystal growth from vapours - by condensing ionised vapours

C30B 29/40 (2006.01) Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape

H01J 37/32 (2006.01) Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Gas-filled discharge tubes

Event Publications

27 September 2007 PCT application entered the National Phase

  PCT publication WO2006/097804 Priority application(s): WO2006/097804

7 October 2010 Assignment before Grant

  EpiSpeed S.A. The application has been assigned to Sulzer Metco AG

2 February 2012 Application Accepted

  Published as AU-B-2006224282

31 May 2012 Standard Patent Sealed

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