Vapor deposited film by plasma CVD method

Details for Australian Patent Application No. 2006216352 (hide)

Owner Toyo Seikan Kaisha, Ltd.

Inventors Nakayama, Megumi; Nakano, Ryuta; Kitou, Satoru; Inagaki, Hajime; Ieki, Toshihide

Agent Phillips Ormonde Fitzpatrick

Pub. Number AU-A-2006216352

PCT Pub. Number WO2006/090602

Priority 2005-137982 11.05.05 JP; 2005-045015 22.02.05 JP

Filing date 7 February 2006

Wipo publication date 31 August 2006

International Classifications

C23C 16/44 (2006.01) Chemical deposition or plating by decomposition - characterised by the method of coating

B65D 1/00 (2006.01) General kinds of rigid or semi-rigid containers

B65D 23/02 (2006.01) Details of rigid or semi-rigid containers not otherwise provided for

C23C 16/40 (2006.01) Chemical deposition or plating by decomposition - Oxides

C23C 16/50 (2006.01) Chemical deposition or plating by decomposition - using electric discharges

Event Publications

13 September 2007 PCT application entered the National Phase

  PCT publication WO2006/090602 Priority application(s): WO2006/090602

1 September 2011 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(d). Examination has been requested or an examination report has issued for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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