Water-soluble amphoteric copolymer, production method thereof, and application thereof

Details for Australian Patent Application No. 2006202928 (hide)

Owner Nippon Shokubai Co., Ltd.

Inventors Fujii, Yoshikazu; Hattori, Daisuke; Tsumori, Takahiro

Agent Griffith Hack

Pub. Number AU-A-2006202928

Priority 2005-200372 08.07.05 JP

Filing date 7 July 2006

Wipo publication date 25 January 2007

International Classifications

C08F 220/34 (2006.01) Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof

C08F 216/02 (2006.01) Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical

C08F 216/20 (2006.01) Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical

C08F 228/02 (2006.01) Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur

C08K 3/32 (2006.01) Use of inorganic ingredients

C08K 3/34 (2006.01) Use of inorganic ingredients

C11D 3/37 (2006.01) Other compounding ingredients of detergent compositions covered in group - Polymers

Event Publications

27 July 2006 Complete Application Filed

  Priority application(s): 2005-200372 08.07.05 JP

25 January 2007 Application Open to Public Inspection

  Published as AU-A-2006202928

10 June 2010 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(a). A direction to request examination has been given for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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