Anti-reflective substrate and the manufacturing method thereof

Details for Australian Patent Application No. 2006201341 (hide)

Owner Tatung Company

Inventors Lin, Chiung-Wei; Teng, Chein-Fu; Chen, Yi-Liang

Agent Spruson & Ferguson

Pub. Number AU-B-2006201341

Priority 094139436 10.11.05 TW

Filing date 30 March 2006

Wipo publication date 24 May 2007

Acceptance publication date 18 October 2007

International Classifications

C23C 14/10 (2006.01) Coating by vacuum evaporation, by sputtering or by ion implantation - Glass or silica

C23C 14/24 (2006.01) Coating by vacuum evaporation, by sputtering or by ion implantation - Vacuum evaporation

C23C 14/35 (2006.01) Coating by vacuum evaporation, by sputtering or by ion implantation - by application of a magnetic field, e.g. magnetron sputtering

C23C 14/58 (2006.01) Coating by vacuum evaporation, by sputtering or by ion implantation - After-treatment

C23C 16/24 (2006.01) Chemical deposition or plating by decomposition

C23C 16/56 (2006.01) Chemical deposition or plating by decomposition - After-treatment

C23F 1/24 (2006.01) Etching metallic material by chemical means

Event Publications

27 April 2006 Complete Application Filed

  Priority application(s): 094139436 10.11.05 TW

24 May 2007 Application Open to Public Inspection

  Published as AU-B-2006201341

18 October 2007 Application Accepted

  Published as AU-B-2006201341

14 February 2008 Standard Patent Sealed

29 May 2008 Assignment Registered

  Tatung Company The patent has been assigned to Tatung Company; Tatung University

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