Nanoimprint lithograph for fabricating nanoadhesive

Details for Australian Patent Application No. 2005205841 (hide)

Owner Lee, B.

Inventors Hsieh, Wen-Jiunn; Chao, Chih-Yu

Agent A.P.T. Patent and Trade Mark Attorneys

Pub. Number AU-A-2005205841

Priority 94125183 25.07.05 TX; 94109887 29.03.05 TX

Filing date 7 September 2005

Wipo publication date 19 October 2006

International Classifications

B81C 1/00 (2006.01) Manufacture or treatment of devices or systems in or on a substrate

G03F 7/00 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces

H01L 21/027 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 September 2005 Complete Application Filed

  Priority application(s): 94125183 25.07.05 TX; 94109887 29.03.05 TX

19 October 2006 Application Open to Public Inspection

  Published as AU-A-2005205841

10 April 2008 Assignment before Grant

  Lee , BingHuan The application has been assigned to Contrel Technology Co., Ltd.

9 September 2010 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(e). Examination has been requested or an examination report has issued for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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