Process for producing silicon

Details for Australian Patent Application No. 2005203195 (hide)

Owner Tokuyama Corporation

Inventors Wakamatsu, Satoru; Sugimura, Shigeki

Agent Davies Collison Cave

Pub. Number AU-A-2005203195

Priority 2004-214492 22.07.04 JP

Filing date 21 July 2005

Wipo publication date 9 February 2006

International Classifications

C01B 33/027 (2006.01) Silicon

C30B 28/14 (2006.01) Production of homogeneous polycrystalline material with defined structure

C30B 29/06 (2006.01) Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape - Silicon

H01L 31/0368 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

H01L 31/18 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

Event Publications

4 August 2005 Complete Application Filed

  Priority application(s): 2004-214492 22.07.04 JP

9 February 2006 Application Open to Public Inspection

  Published as AU-A-2005203195

2 July 2009 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(a). A direction to request examination has been given for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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