Method for depositing silicon

Details for Australian Patent Application No. 2004215243 (hide)

Owner Forschungszentrum Julich GmbH

Inventors Roschek, Tobias; Rech, Bernd

Agent Davies Collison Cave

Pub. Number AU-B-2004215243

PCT Pub. Number WO2004/076713

Priority 103 08 381.2 27.02.03 DE

Filing date 20 January 2004

Wipo publication date 10 September 2004

Acceptance publication date 3 December 2009

International Classifications

C23C 16/24 (2006.01) Chemical deposition or plating by decomposition

C23C 16/455 (2006.01) Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C23C 16/505 (2006.01) Chemical deposition or plating by decomposition

H01L 21/205 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 31/18 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

C23C 16/44 (2006.01) Chemical deposition or plating by decomposition - characterised by the method of coating

Event Publications

6 October 2005 PCT application entered the National Phase

  PCT publication WO2004/076713 Priority application(s): WO2004/076713

3 December 2009 Application Accepted

  Published as AU-B-2004215243

1 April 2010 Standard Patent Sealed

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