LOW SILICON-OUTGASSING RESIST FOR BILAYER LITHOGRAPHY

Details for Australian Patent Application No. 2003303304 (hide)

Owner INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventors WONG, Ranee, W.; CHEN, KuangJung; VARANASI, Pushkara, Rao; ALLEN, Robert, D.; BROCK, Phillip; HOULE, Frances; SOORIYAKUMARAN, Ratnam; KHOJASTEH, Mahmoud, M.

Pub. Number AU-A-2003303304

PCT Number PCT/US2003/0287

PCT Pub. Number WO2004/068243

Priority 10/241,937 11.09.02 US

Filing date 11 September 2003

Wipo publication date 23 August 2004

International Classifications

G03F 007/38 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment before imagewise removal, e.g. prebaking

Event Publications

19 August 2004 Complete Application Filed

  Priority application(s): 10/241,937 11.09.02 US

23 September 2004 Application Open to Public Inspection

  Published as AU-A-2003303304

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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