CHEMICAL AMPLIFICATION TYPE SILICONE BASE POSITIVE PHOTORESIST COMPOSITION

Details for Australian Patent Application No. 2003302990 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors TAMURA, Kouki; SATO, Kazufumi; HIRAYAMA, Taku; YAMADA, Tomotaka; KAWANA, Daisuke

Pub. Number AU-A-2003302990

PCT Number PCT/JP2003/0153

PCT Pub. Number WO2004/055598

Priority 2002-350563 02.12.02 JP; 2003-46611 24.02.03 JP; 2003-190618 02.07.03 JP

Filing date 1 December 2003

Wipo publication date 9 July 2004

International Classifications

G03F 007/11 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - having cover layers or intermediate layers, e.g. subbing layers

C08G 077/14 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

5 August 2004 Complete Application Filed

  Priority application(s): 2002-350563 02.12.02 JP; 2003-46611 24.02.03 JP; 2003-190618 02.07.03 JP

19 August 2004 Application Open to Public Inspection

  Published as AU-A-2003302990

22 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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