EXPOSURE METHOD, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

Details for Australian Patent Application No. 2003302831 (hide)

Owner NIKON CORPORATION

Inventors MAGOME, Nobutaka; NEI, Masahiro; HIRUKAWA, Shigeru; KOBAYASHI, Naoyuki; OWA, Soichi

Pub. Number AU-A-2003302831

PCT Number PCT/JP2003/0154

PCT Pub. Number WO2004/053951

Priority 2002-357959 10.12.02 JP; 2003-169903 13.06.03 JP

Filing date 2 December 2003

Wipo publication date 30 June 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

29 July 2004 Complete Application Filed

  Priority application(s): 2002-357959 10.12.02 JP; 2003-169903 13.06.03 JP

5 August 2004 Application Open to Public Inspection

  Published as AU-A-2003302831

22 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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