POLYMER COMPOUND, RESIST COMPOSITION AND DISSOLUTION INHIBITOR AGENT CONTAINING THE POLYMER COMPOUND

Details for Australian Patent Application No. 2003302653 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors SATO, Mitsuru; OGATA, Toshiyuki; ENDO, Kotaro; TSUJI, Hiromitsu; YOSHIDA, Masaaki; HADA, Hideo; TAKASU, Ryoichi

Pub. Number AU-A-2003302653

PCT Number PCT/JP2003/0152

PCT Pub. Number WO2004/050725

Priority NO. 2002-349167 29.11.02 JP

Filing date 28 November 2003

Wipo publication date 23 June 2004

International Classifications

C08F 020/22 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof

C08F 016/12 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 July 2004 Complete Application Filed

  Priority application(s): NO. 2002-349167 29.11.02 JP

29 July 2004 Application Open to Public Inspection

  Published as AU-A-2003302653

22 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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