METHOD OF ELECTROPLATING COPPER OVER A PATTERNED DIELECTRIC LAYER TO ENHANCE PROCESS UNIFORMITY OF A SUBSEQUENT CMP PROCESS
Details for Australian Patent Application No. 2003302261 (hide)
International Classifications
Event Publications
15 July 2004 Complete Application Filed
Priority application(s): 103 19 135.6 28.04.03 DE; 10/666,195 19.09.03 US
23 December 2004 Application Open to Public Inspection
Published as AU-A-2003302261
12 January 2006 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired
This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.
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