COMPOSITION FOR POROUS FILM FORMATION, POROUS FILMS, PROCESS FOR PRODUCTION OF THE FILMS, INTERLAYER DIELECTRICS, AND SEMICONDUCTOR DEVICES

Details for Australian Patent Application No. 2003301929 (hide)

Owner MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

Inventors HAMADA, Yoshitaka; YAGIHASHI, Fujio; NAKAGAWA, Hideo; SASAGO, Masaru

Pub. Number AU-A-2003301929

PCT Number PCT/JP2003/0144

PCT Pub. Number WO2004/044972

Priority 2002-329125 13.11.02 JP

Filing date 13 November 2003

Wipo publication date 3 June 2004

International Classifications

H01L 021/312 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C08G 077/18 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

C09D 183/02 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysilicates

C09D 183/04 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysiloxanes

Event Publications

1 July 2004 Complete Application Filed

  Priority application(s): 2002-329125 13.11.02 JP

8 July 2004 Application Open to Public Inspection

  Published as AU-A-2003301929

28 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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