A METHOD AND APPARATUS FOR FORMING A HIGH QUALITY LOW TEMPERATURE SILICON NITRIDE FILM

Details for Australian Patent Application No. 2003301123 (hide)

Owner APPLIED MATERIALS, INC.

Inventors WANG, Shulin; SANCHEZ, Errol, Antonio, C.; CHEN, Aihua

Pub. Number AU-A-2003301123

PCT Number PCT/US2003/0405

PCT Pub. Number WO2004/059707

Priority 10/327,467 20.12.02 US

Filing date 18 December 2003

Wipo publication date 22 July 2004

International Classifications

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

27 May 2004 Complete Application Filed

  Priority application(s): 10/327,467 20.12.02 US

26 August 2004 Application Open to Public Inspection

  Published as AU-A-2003301123

22 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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