METHOD FOR SUPPORTING SUBSTRATE, SUBSTRATE SUPPORTING APPARATUS AND EXPOSURE APPARATUS

Details for Australian Patent Application No. 2003298996 (hide)

Owner SENDAI NIKON CORPORATION

Inventors KIKUCHI, Hidekazu

Pub. Number AU-A-2003298996

PCT Number PCT/JP2003/0087

PCT Pub. Number WO2004/027856

Priority 2002-272842 19.09.02 JP

Filing date 10 July 2003

Wipo publication date 8 April 2004

International Classifications

H01L 021/68 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

13 May 2004 Complete Application Filed

  Priority application(s): 2002-272842 19.09.02 JP

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003298996

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

1 September 2005 Corrigenda

  Applications OPI - Name Index Under the name SENDAI NIKON CORPORATION, Application No. 2003298996, under INID (71) correct the name to read NIKON CORPORATION; SENDAI NIKON CORPORATION

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