METHOD AND APPARATUS FOR BILAYER PHOTORESIST DRY DEVELOPMENT

Details for Australian Patent Application No. 2003297861 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors IGARASHI, Yoshiki; INAZAWA, Koichiro; HIGUCHI, Kimihiro; BALASUBRAMANIAM, Vaidyanathan; NISHIMURA, Eiichi; KIM, Ralph; SANSONE, Philip; HAGIHARA, Masaaki

Pub. Number AU-A-2003297861

PCT Number PCT/US2003/0393

PCT Pub. Number WO2004/061919

Priority 60/483,234 30.06.03 US; 60/435,286 23.12.02 US; 60/483,235 30.06.03 US

Filing date 12 December 2003

Wipo publication date 29 July 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3105 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/09 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - characterised by structural details, e.g. supports, auxiliary layers

H01L 021/311 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

6 May 2004 Complete Application Filed

  Priority application(s): 60/483,234 30.06.03 US; 60/435,286 23.12.02 US; 60/483,235 30.06.03 US

2 September 2004 Application Open to Public Inspection

  Published as AU-A-2003297861

15 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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