PROCESS FOR IMPROVING THE SURFACE ROUGHNESS OF A SEMICONDUCTOR WAFER

Details for Australian Patent Application No. 2003296844 (hide)

Owner S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES

Inventors MALEVILLE, Christophe; ECARNOT, Ludovic; NEYRET, Eric

Pub. Number AU-A-2003296844

PCT Number PCT/IB2003/0063

PCT Pub. Number WO2005/055307

Filing date 3 December 2003

Wipo publication date 24 June 2005

International Classifications

H01L 021/324 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/306 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

6 May 2004 Complete Application Filed

11 August 2005 Application Open to Public Inspection

  Published as AU-A-2003296844

17 August 2006 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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