PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, AND PHOTOMASK

Details for Australian Patent Application No. 2003296081 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2003296081

PCT Number PCT/JP2003/0165

PCT Pub. Number WO2004/061918

Priority 2002-381798 27.12.02 JP

Filing date 24 December 2003

Wipo publication date 29 July 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/768 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

29 April 2004 Complete Application Filed

  Priority application(s): 2002-381798 27.12.02 JP

2 September 2004 Application Open to Public Inspection

  Published as AU-A-2003296081

15 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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