DRAIN/SOURCE EXTENSION STRUCTURE OF A FIELD EFFECT TRANSISTOR INCLUDING DOPED HIGH-K SIDEWALL SPACERS

Details for Australian Patent Application No. 2003295406 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors FEUDEL, Thomas; HORSTMANN, Manfred; WIECZOREK, Karsten; KRUEGEL, Stephan

Pub. Number AU-A-2003295406

PCT Number PCT/US2003/0353

PCT Pub. Number WO2004/051728

Priority 10255849.3 29.11.02 DE; 10/442,745 21.05.03 US

Filing date 6 November 2003

Wipo publication date 23 June 2004

International Classifications

H01L 021/336 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 029/78 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

H01L 021/225 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 April 2004 Complete Application Filed

  Priority application(s): 10255849.3 29.11.02 DE; 10/442,745 21.05.03 US

29 July 2004 Application Open to Public Inspection

  Published as AU-A-2003295406

18 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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