RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN USING SAME

Details for Australian Patent Application No. 2003294177 (hide)

Owner TOKYO OHKA KOGYO CO., LTD.

Inventors TAKESHITA, Masaru; MIYAIRA, Miwa; HADA, Hideo; IWAI, Takeshi

Pub. Number AU-A-2003294177

PCT Number PCT/JP2003/0162

PCT Pub. Number WO2004/059391

Priority 2002-373936 25.12.02 JP; 2003-355418 15.10.03 JP

Filing date 18 December 2003

Wipo publication date 22 July 2004

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

22 April 2004 Complete Application Filed

  Priority application(s): 2002-373936 25.12.02 JP; 2003-355418 15.10.03 JP

26 August 2004 Application Open to Public Inspection

  Published as AU-A-2003294177

8 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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