PROCESS FOR IMPROVING THE SURFACE ROUGHNESS OF A WAFER

Details for Australian Patent Application No. 2003294166 (hide)

Owner S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES

Inventors NEYRET, Eric; ARENE, Emmanuel; ECARNOT, Ludovic

Pub. Number AU-A-2003294166

PCT Number PCT/IB2003/0063

PCT Pub. Number WO2005/055308

Filing date 3 December 2003

Wipo publication date 24 June 2005

International Classifications

H01L 021/324 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/477 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/302 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 April 2004 Complete Application Filed

11 August 2005 Application Open to Public Inspection

  Published as AU-A-2003294166

17 August 2006 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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