CHARGE PARTICLE EXPOSURE METHOD, COMPLEMENTARILY DIVIDED MASK USED FOR IT, AND SEMICONDUCTOR DEVICE PRODUCED BY USING THE METHOD

Details for Australian Patent Application No. 2003292695 (hide)

Owner LEEPL CORP.

Inventors NOZUE, Hiroshi

Pub. Number AU-A-2003292695

PCT Number PCT/JP2003/0169

PCT Pub. Number WO2004/064126

Priority 2003-1917 08.01.03 JP

Filing date 26 December 2003

Wipo publication date 10 August 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

22 April 2004 Complete Application Filed

  Priority application(s): 2003-1917 08.01.03 JP

9 September 2004 Application Open to Public Inspection

  Published as AU-A-2003292695

22 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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