PLASMA GENERATOR, OZONE GENERATOR, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Details for Australian Patent Application No. 2003292678 (hide)

Owner HITACHI KOKUSAI ELECTRIC INC. SATO, Noriyoshi MASE, Hiroshi FUJIWARA, Tamiya

Inventors SATO, Noriyoshi; FUJII, Shuitsu; TANIGUCHI, Takeshi; FUJIWARA, Tamiya; MASE, Hiroshi

Pub. Number AU-A-2003292678

PCT Number PCT/JP2003/0168

PCT Pub. Number WO2004/061929

Priority 2002-379963 27.12.02 JP

Filing date 26 December 2003

Wipo publication date 29 July 2004

International Classifications

C23C 016/503 Chemical deposition or plating by decomposition

C01B 013/11 Oxygen - by electric discharge

H05H 001/24 Generating plasma - Generating plasma

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 April 2004 Complete Application Filed

  Priority application(s): 2002-379963 27.12.02 JP

2 September 2004 Application Open to Public Inspection

  Published as AU-A-2003292678

1 September 2005 Corrigenda

  Applications OPI - Name Index Under the name HITACHI KOKUSAI ELECTRIC INC.; SATO, Noriyoshi; MASE, Hiroshi; FUJIWARA, Tamiya, Application No. 2003292678, under INID (71) correct the name to read HITACHI KOKUSAI ELECTRIC INC.; SATO, Noriyoshi; MASE, Hiroshi; FUJIWARA, Tamiya; ADTEC PLASMA TECHNOLOGY CO., LTD.

15 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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